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四(乙基甲基胺基)铪(IV)，Tetrakis(ethylmethylamido)hafnium(IV) [TEMAH]；≥99.99% trace metals basis
553123
![图片 四(乙基甲基胺基)铪(IV)，Tetrakis(ethylmethylamido)hafnium(IV) [TEMAH]；≥99.99% trace metals basis](https://www.bszh.cn/images/thumbs/0018815_ivtetrakisethylmethylamidohafniumiv-temah9999-trace-metals-basis_415.png "显示明细 四(乙基甲基胺基)铪(IV)，Tetrakis(ethylmethylamido)hafnium(IV) [TEMAH]；≥99.99% trace metals basis")
别名：四(乙基甲基氨基)铪(IV)；TEMAH；Tetrakis(ethylmethylamino)hafnium(IV)
线性分子式: [(CH3)(C2H5)N]4Hf CAS号: 352535-01-4 分子量: 410.90 MDL编号: MFCD03427130 PubChem化学物质编号: 24879306 NACRES: NA.23
线性分子式: [(CH3)(C2H5)N]4Hf CAS号: 352535-01-4 分子量: 410.90 MDL编号: MFCD03427130 PubChem化学物质编号: 24879306 NACRES: NA.23
四(乙基甲基胺基)铪(IV)，Tetrakis(ethylmethylamido)hafnium(IV) [TEMAH]；packaged for use in deposition systems
725544
![图片 四(乙基甲基胺基)铪(IV)，Tetrakis(ethylmethylamido)hafnium(IV) [TEMAH]；packaged for use in deposition systems](https://www.bszh.cn/images/thumbs/0018816_ivtetrakisethylmethylamidohafniumiv-temahpackaged-for-use-in-deposition-systems_415.png "显示明细 四(乙基甲基胺基)铪(IV)，Tetrakis(ethylmethylamido)hafnium(IV) [TEMAH]；packaged for use in deposition systems")
包装用于沉积系统；别名：四(乙基甲基氨基)铪(IV)；TEMAH；Tetrakis(ethylmethylamino)hafnium(IV)
线性分子式: [(CH3)(C2H5)N]4Hf CAS号: 352535-01-4 分子量: 410.90 MDL编号: MFCD03427130 PubChem化学物质编号: 329764168 NACRES: NA.23
线性分子式: [(CH3)(C2H5)N]4Hf CAS号: 352535-01-4 分子量: 410.90 MDL编号: MFCD03427130 PubChem化学物质编号: 329764168 NACRES: NA.23
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