ADT;ublimed, 97%
最近浏览商品
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Pure Strip光刻胶除胶剂,Pure Strip;stabilized sulfuric acid-hydrogen peroxide compound -
叶酸,Folic acid [PteGlu];BioReagent, suitable for cell culture, suitable for insect cell culture, suitable for plant cell culture, ≥97% -
双草醚,Bispyribac sodium salt;PESTANAL®, analytical standard -
FK 269 Co(III) TFSI salt;98% -
甲酰胺,Formamide;spectrophotometric grade, ≥99% -
异丁酸,Isobutyric acid;puriss. p.a., ≥99.5%
