硫酸亚铈(III)八水合物,Cerium(III) sulfate octahydrate;99.999% trace metals basis
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四(乙基甲基胺基)锆(IV),Tetrakis(ethylmethylamido) zirconium(IV) [TEMAZ];packaged for use in deposition systems -
氯化锰(II)双(氯化锂)络合物溶液,Manganese(II) chloride bis(lithium chloride) complex solution;density: 0.956 g/mL at 25 °C, 0.5 M in THF -
N-甲基-d3-4-苯基碘吡啶,N-Methyl-d3-4-phenylpyridinium iodide;99 atom % D -
硫酸钕(III)水合物,Neodymium(III) sulfate hydrate;99.9% trace metals basis
