四氯化硅，Silicon tetrachloride [STC]；99.998% trace metals basis, packaged for use in deposition systems
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10-樟脑磺酸乙酯，10-Camphorsulfonic Acid Ethyl Ester -
![图片 伊红Y二钠盐 [水溶伊红, 曙红Y二钠盐]，Eosin Y disodium salt；Dye content ≥85%](https://www.bszh.cn/images/thumbs/0001760_y-yeosin-y-disodium-saltdye-content-85_32.png "显示明细 伊红Y二钠盐 [水溶伊红, 曙红Y二钠盐]，Eosin Y disodium salt；Dye content ≥85%")
伊红Y二钠盐 [水溶伊红, 曙红Y二钠盐]，Eosin Y disodium salt；Dye content ≥85% -
![图片 5'-脱氧-5-氟尿苷 [去氧氟尿苷]，5-Fluoro-5′-deoxyuridine [5′dFUrd]；≥98%](https://www.bszh.cn/images/thumbs/0002377_5-5-5-fluoro-5-deoxyuridine-5dfurd98_32.png "显示明细 5'-脱氧-5-氟尿苷 [去氧氟尿苷]，5-Fluoro-5′-deoxyuridine [5′dFUrd]；≥98%")
5'-脱氧-5-氟尿苷 [去氧氟尿苷]，5-Fluoro-5′-deoxyuridine [5′dFUrd]；≥98% -
1,2-苯并异噻唑-3-酮，1,2-Benzisothiazol-3(2H)-one；analytical standard, ≥98.0% (HPLC) -
DL-鸟氨酸单盐酸盐，DL-Ornithine monohydrochloride；≥99.0% (AT) -
氢氧化钡八水合物，Barium hydroxide octahydrate；ACS reagent, ≥98%
