六甲基二硅氮烷 [HMDS]，Hexamethyldisilazane；20% solution in xylene

图片 六甲基二硅氮烷 [HMDS]，Hexamethyldisilazane；20% solution in xylene
别名：双(三甲基硅烷基)胺；1,1,1,3,3,3-六甲基二硅氮烷；1,1,1,3,3,3-Hexamethyldisilazane；Bis(trimethylsilyl)amine

线性分子式: C6H19NSi2 CAS号: 999-97-3 NACRES: NA.23
制造商品牌: 西格玛 Sigma-Aldrich
货号（SKU）: 901482
CAS号: 999-97-3
MDL号: MFCD00008259
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说明

该产品用于增强光刻胶在硅和 SiO2 表面上的附着力。

HMDS 对粘附的有效性与该化合物与表面羟基形成新硅氧烷终产物的反应性相关，即 Si-O-Si(CH3)3。 这种在基板上新形成的终端使表面在特性上更具疏水性，并导致光刻胶具有更大的润湿性。 后一种条件是良好粘合的关键因素。 由于表面化学性质的这些改变，处理过的硅表面变得与负性和正性光刻胶高度相容。

HMDS 制剂通常在旋转时应用到硅晶片上，然后再应用光刻胶。 作为替代程序，可以将晶片浸入 HMDS 制剂中并在移除后使其干燥。

一般描述

The product is used to augment the adhesion of photoresist on silicon and SiO2 surfaces.
The effectiveness of HMDS on adhesion is correlated with the reactivity of this compound with surface hydroxyl groups to form a new siloxane end product, i.e. Si-O-Si(CH3)3. This newly formed termination on the substrate renders the surface more hydrophobic in character and leads to greater wettability by photoresist. The latter condition is a crucial factor in good bonding. As a result of these altered characteristics due to the surface chemistry, the treated silicon surfaces become highly compatible with both negative and positive photoresists.
 

应用

HMDS preparations are generally applied to the silicon wafer while spinning, prior to the application of photoresist. As an alternative procedure, the wafers may be immersed in HMDS preparations and allowed to dry after removal.
 

特点和优势

  • Ready-to-use preparations for surface treatment of silicon.
  • Promotes photoresist adhesion on silicon and SiO2 films.
  • Prevents lift-off at edges of photoresist and reduces undercutting.
  • Ensures full-line resolution.
  • Improves yields of MOS and integrated silicon devices.
 

属性

质量水平

100

形式

liquid

InChI

1S/C6H19NSi2/c1-8(2,3)7-9(4,5)6/h7H,1-6H3

InChI key

FFUAGWLWBBFQJT-UHFFFAOYSA-N

 

安全信息

警示用语：

Danger

危险分类

Acute Tox. 3 Dermal - Acute Tox. 4 Inhalation - Aquatic Chronic 3 - Asp. Tox. 1 - Eye Dam. 1 - Flam. Liq. 3 - Skin Corr. 1B - STOT RE 2 - STOT SE 3

靶器官

hearing organs, Respiratory system

储存分类代码

3 - Flammable liquids

WGK

WGK 2

闪点(F)

77.0 °F

闪点(C)

25 °C

商品规格
属性名称属性值
储存温度 Storage temp.常温阴凉避光
全球实时库存 Availability √美国St. Louis ≥ 20 | 欧洲Eur. ≥ 16 | 東京Tokyo ≥ 5 | 香港与北京 ≥ 20
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