醋酸钬(III)水合物,Holmium(III) acetate hydrate;99.99% trace metals basis
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六甲基环三硅氧烷,Hexamethylcyclotrisiloxane;98% -
三氟乙酸,Trifluoroacetic acid [TFA];eluent additive for LC-MS, LiChropur, ≥99.0% (GC) -
氯化铑(III)水合物,Rhodium(III) chloride hydrate;99.95% trace metals basis -
己基N-环化苝二亚胺,Hexyl N-annulated perylene diimide [nPDI] -
草酸铵一水合物,Ammonium oxalate monohydrate;≥99.99% trace metals basis -
草酸铵一水合物,Ammonium oxalate monohydrate;ACS reagent, ≥99%
